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Flux removal is motivated by several factors, and the importance of these factors varies with the end use of the product. In general, the purpose of cleaning is (1) to remove corrosive residues from the soldering process or handling operations (some fluxes have high levels of halide activators that would cause corrosion were they not removed); (2) to remove rosin, resin, or other insulating residues that would interfere with bed-of-nails electrical testing; (3) to remove rosin, resin, or other residues that attract dust, dirt, and other airborne contaminants; (4) to ensure that the board is free of residues and contamination prior to conformal coating. In the early days of soldering, cleaning was either not done, because the flux was mostly rosin and noncorrosive (e.g., the telecom fluxes), or cleaning of rosin flux residue was done with solvents. Typically the solvent was a halogenated material, as such solvents were considered relatively nontoxic and were nonflammable. However, in the late 1970s, the Environment Protection Agency (EPA) listed some of these solvents, such as perchloroethylene and trichloroethylene, as suspected carcinogens and lowered the allowed level of these in the operator-breathing zone. This led to the application of CFC azeotropes with methyl alcohol, ethyl alcohol, and methylene chloride as replacements. However, the CFCs were not without their own environmental problems. In September 1987 at the United Nations Environment Program Conference in Montreal, 24 countries signed the Montreal Protocol on Substances that Deplete the Ozone Layer. The protocol was the beginning of an international agreement on the reduction of CFCs that were shown to have a deleterious effect on the stratospheric ozone layer that protects us from harmful ultraviolet radiation. The initial protocol targeted CFCs and halons (bromine-containing CFCs) and proposed a 50 percent reduction in production by 1998 based on 1986 levels. Revisions to the protocol led to a ban on the manufacture of CFCs and other ozone-depleting chemicals effective by the end of 1995.
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Solvent Cleaning With the general elimination of the halogenated solvents, manufacturers have changed their flux and cleaning choices. The new cleaning materials must be capable of dissolving the particular chemical residues from a given flux formulation. Several detailed cleaning references are available.11, 12, 13, 14, 15, 16 Solvent cleaning options17 have focused on semiaqueous cleaning, solvent defluxing using a blend of solvents, and vapor degreasing using a single or co-solvent mix. Semiaqueous cleaning usually involves a two-step process where the assembly is first cleaned in the organic solvent, then rinsed in a separate step.Terpenes have been widely used as the solvent with dibasic esters and non-ionic surfactants added to improve cleaning and rinsing. An alternative semiaqueous cleaning solvent is composed of high molecular alcohols. The solvent is usually sprayed under immersion onto the assemblies in its pure form. This step is followed by a rinse step that emulsifies the semiaqueous solvent and dissolves the ionic residues. Innovations18 have shown that an aqueous emulsified solution of the solvent can also provide good cleaning. Solvent cleaners may be inline or batch. Inline cleaning usually involves spray under immersion.The temperature of the solvent wash tank is set below its flash point, and several rinse tanks follow the wash tank to ensure good cleaning before the final drying step. Solvents such as glycol-ether blends are used for this process. Batch degreasers may use n-propyl bromide in specialized applications. Traditional batch cleaning was performed in a vapor degreaser that has a wash sump of boiling nonflammable azeotropic solvent and a rinse sump. A vapor blanket forms above the sump and is contained using cooling coils at the mouth of the machine. The assembly is first placed into the wash sump, and then is transferred to a rinse sump that contains clean solvent from the condensation at the cooling coils. As the assembly is removed, it is held for a period in the vapor blanket for a final rinse and drying of the remaining solvent.
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