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ELECTRONICS, SEMICONDUCTORS, AND OTHER ELECTRICAL EQUIPMENT
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33.6 Case Study
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The operations of high-tech companies are facing severe challenges from rapid changing of outside environment. The corporate vision should include the environmental aspects and policies to ensure continuous growth of the operation. Besides, in order to realize business globalization, it is required not only to develop high-quality products, but also to implement environment management for the operation. Especially for most of semiconductor companies, a strong environmental protection policy is inevitable as a key factor for success of the manufacturing operation. In 2003, a solid waste minimization study was conducted at a large semiconductor manufacturing facility in California. The global company employs over 3500 individuals and generated over $24 billion in 2007. At the time of the audit, the company was pursuing new product and technology development as well as promotion and implementation of a waste minimization project. Figure 33.1 shows a semiconductor wafer manufactured at the facility. The largest waste minimization efforts in the semiconductor industry are in source reduction. An effective source-reduction method is the use of acid spray processors for cleaning and etching wafers instead of the standard batch processing in an acid bath. Acid spray processing can reduce chemical consumption by using the cleaning chemical in an on-demand mode. In batch processing, once the chemicals are mixed they have a speci c lifetime after which the cleaning ability of the solution is substantially
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Semiconductor wafer.
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CASE STUDY
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reduced (Briones, 2006). The advantage of using cleaning chemicals only when they are needed, as in spray processors, is that it eliminates the need to replenish spent chemicals that result from batch processing. Another substantial reduction of process chemicals can be accomplished through the use of gas- and vapor-phase processing, as compared to liquid-phase processing in the wafer-cleaning sequence. An advantage of cleaning with chemicals in a gas phase is that large volumes of wafers can be processed relatively quickly with smaller volumes of chemicals. For example, one available technique can clean 90,000 wafers using a 2.2-kg (5-lb) bottle of anhydrous hydrogen uoride [HF] gas (Hara and Peterson, 1988). This compares to a conservative estimate of 9360 L of 12:1 HF deionized water mixture to clean the same number of wafers. The waste minimization process began by establishing a task team and conducting a solid waste audit. Results from the audit indicated that the 310 employee facility generated 850 tons of solid waste per year and paid $50,000 to dispose of solid waste. As a result of the analysis, the total cost reduction and additional revenue generation was about $35,000 per year. Finally, industrial waste minimization activities will be combined with an environmental management system (EMS) for implementing the environment policies of the company for continuous improvement. The following examples document source reduction in the semiconductor industry for this case study.
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The company involved in this study concentrated on waste elimination through changes in product design and manufacturing technology (Briones, 2006). At this plant, during a period when manufacturing output increased by 10 percent, chromic acid use dropped by 96 percent due to manufacturing-technology changes. The reduction was accomplished by developing a copper nitrate based etchant that contained no chromium and generated no hazardous waste (Briones, 2006). This etchant has a long lifetime, no sludge buildup with repeated use, no unusual gases generated, and is slow to heat under normal usage. As a result, the copper-based etchant was substituted for chromium-based etchants on all but one silicon product. The chromium-treatment sludge at the facility was reduced drastically. Between 1988 and 1991, the plant reduced the amount of chromium sludge generated by 81 percent. The chromium content of the sludge also was reduced from 47,000 ppm (parts per million) by weight to 6200 ppm. A number of other waste minimization activities were instituted which saved the plant more than $380,000 annually (Briones, 2006).
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