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Microwave and electron cyclotron resonance CVD ( W / ECR CVD) Plasma is generated in a reactive gas mixture by a high-frequency electric field, such as generated by microwaves (Figure 233 (c)) or by electron cyclotron resonance (ECR) By using these methods, the coatings are very uniform over a large area (200 mm and more), smooth and of a high purity But the growth rate is very low, of the order of 01 m/h [40] By this process, large areas of uniform and homogeneous polycrystalline thin diamond films of a high quality can be obtained, predestined for electronic, optical and sensor applications Combustion synthesis (Oxy-acetylene torch and RF-high energy plasma torch) Combustion synthesis is another method in which the plasma is generated either by a chemical flame such as an oxygen acetylene torch, O2 C2H2 as depicted in Figure 233 (d) and Figure 233 (e) or by an HF torch (Figure 233 (f )) Both methods, chemical and physical, operate at very high temperatures, the chemical torch above 3,000 K and the plasma torches up to 8,000 K In both the cases the substrates to be coated need to be cooled When using oxygen acetylene torch, the deposition mode using a flame in the turbulent rather than in the laminar flow regime presents some advantages especially in what concerns the growth rate, which can be an order of magnitude greater In both modes, the coatings are irregular, non-homogeneous but relatively pure, depending on the purity of the gases Acetylene, C2H2, unfortunately cannot be easily cleaned economically to a high purity The growth rate can be orders of magnitude greater than obtained by other methods and is, for oxygen acetylene torch in the turbulent flame regime, typically 50 m/h
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Fig 233: Six methods of diamond deposition are shown here [40, 41]: (a) A hot filament reactor, (b) a schematic
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of a thermal CVD reactor, (c) a microwave plasma activated CVD reactor, (d) an oxygen acetylene torch deposition of diamond, (e) flame shapes of the oxygen acetylene torch deposition of diamond [40] and (f) an HF plasma torch CVD reactor
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Figure 234 shows examples of the different morphologies observed on using a scanning electron microscope CVD diamond tools are excellent for machining highly abrasive nonferrous alloys such as Al Si, and at the time were inexpensive compared to PCDS [39] The CVD diamond combines the advantages of both single-crystal diamonds and PCDs which are stated as follows: (i) binder-free diamond coating with a higher hardness, wear resistance, thermal resistance than PCDs, (ii) highly dense polycrystalline pure diamond coating without the inherent shortcoming of a single-crystal cleavage Also, the lower fracture toughness of the CVD diamond than of PCDs is somewhat offset by the fact that its higher thermal conductivity and improved thermal stability allow CVD diamond tools to run at faster speeds without generating harmful levels of heat CVD diamonds find applications in making inserts, drills, reamers, end mill and routers and offer an advantage over PCDs such as multiple edges per insert and pressed-in chip breakers for machining gummy materials such as aluminium 6061 In Figure 235, a diamond coated insert is compared with a PCD insert, and in Figure 236, a diamond coated tool edge is compared with an SCD tool [41]
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Fig 234: Morphologies of films grown in a hot filament CVD reactor: (a) triangular {111} morphology, (b) {110}
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morphology, (c) {100} morphology and (d) cauliflower morphology [39]
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(b) (a) Fig 235: (a) A diamond coated carbide insert with a tool holder and (b) a polycrystalline diamond tipped insert in the tool holder [41]
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(a) rake angle [41]
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